Batch Plasma Processing of Gallium Nitride as a Production Solution

Introduction Recent history has seen the market for Gallium Nitride (GaN) devices grow dramatically with the LED chip market alone predicted to reach $3.4 billion by the end of 2003. Combine this with the emergence of next generation DVD players, which use the GaN blue laser technology, unique GaN high power/high frequency devices and GaN photodetectors and the importance of GaN technology can clearly be seen. Though advances are being made in the growth technology of compound semiconductors, device quality wafer size remains at a maximum of 2” for GaN and its related materials. The consequence of this is that single wafer processing can severely impact on production throughput and therefore profitability. Oxford Instruments Plasma Technology has developed processes capable of etching large numbers of wafers in single batches, providing an ideal solution for your production needs.